Groundbreaking advancement in silicon technology achieved by a South Korean semiconductor company through innovative lithography.
SK hynix Unveils Groundbreaking High-NA EUV System for Next-Generation Memory Production
South Korean memory chip giant SK hynix has taken a significant step forward in its quest to lead the AI memory space and strengthen its position in the high-value memory product market. The company has assembled the industry's first High-NA EUV lithography system for mass production at its M16 fabrication plant in Icheon, South Korea.
The new system, the TWINSCAN EXE:5200B, is the first model for volume production of ASML's High NA EUV product line. This system is a crucial addition for SK hynix, as it aims to simplify the existing EUV process, accelerate the development of the next-generation memory, and meet the demands of the fast-growing AI and next-generation computing markets.
The High NA EUV system boasts a higher Numerical Aperture (NA) of 0.55, an improvement of 40% from the existing EUV system's NA of 0.33. This higher NA enables a more precise pattern, which leads to a more sophisticated process technology. A more sophisticated process technology is critical to advance productivity and product performance, as it allows for the printing of transistors 1.7 times smaller and achieves transistor densities 2.9 times higher compared to the existing EUV system.
The assembly of this High NA EUV system lays the foundation for swift development and supply of cutting-edge products. SK hynix expects the addition of the new system to bring its technological vision into reality, enhancing its leadership in the AI memory space. The company aims to make its technological leadership stronger and enhance its position in the high-value memory product market.
ASML, a global leader in photolithography technology, will closely collaborate with SK hynix to bring forward the innovation of the next-generation memory. This collaboration is expected to accelerate the development of advanced memory solutions that will power the AI and next-generation computing markets.
SK hynix Inc. has been expanding the scope of EUV adoption for the production of the most advanced DRAM since 2021. The company aims to enhance credibility and stability of the global supply chain through close collaboration with business partners. Further information about SK hynix is available at www.skhynix.com and news.skhynix.com.
The assembled equipment is intended for the production of next-generation DRAM. A more sophisticated pattern leads to an increase in the number of chips produced from a wafer and an improvement in power efficiency and performance. The High NA EUV lithography system delivers better resolution than earlier EUV systems, enabling the world's finest patterns.
SK hynix plans to utilise this new system to accelerate the development of the next-generation memory, aiming to enhance its leadership in the AI memory space. The company's efforts to prepare for the industry's requirement for extreme scaling and high density are evident in the assembly of the High NA EUV system. This system is a testament to SK hynix's commitment to innovation and its pursuit of technological excellence.
